• <tr id='X7MNxV'><strong id='X7MNxV'></strong><small id='X7MNxV'></small><button id='X7MNxV'></button><li id='X7MNxV'><noscript id='X7MNxV'><big id='X7MNxV'></big><dt id='X7MNxV'></dt></noscript></li></tr><ol id='X7MNxV'><option id='X7MNxV'><table id='X7MNxV'><blockquote id='X7MNxV'><tbody id='X7MNxV'></tbody></blockquote></table></option></ol><u id='X7MNxV'></u><kbd id='X7MNxV'><kbd id='X7MNxV'></kbd></kbd>

    <code id='X7MNxV'><strong id='X7MNxV'></strong></code>

    <fieldset id='X7MNxV'></fieldset>
          <span id='X7MNxV'></span>

              <ins id='X7MNxV'></ins>
              <acronym id='X7MNxV'><em id='X7MNxV'></em><td id='X7MNxV'><div id='X7MNxV'></div></td></acronym><address id='X7MNxV'><big id='X7MNxV'><big id='X7MNxV'></big><legend id='X7MNxV'></legend></big></address>

              <i id='X7MNxV'><div id='X7MNxV'><ins id='X7MNxV'></ins></div></i>
              <i id='X7MNxV'></i>
            1. <dl id='X7MNxV'></dl>
              1. <blockquote id='X7MNxV'><q id='X7MNxV'><noscript id='X7MNxV'></noscript><dt id='X7MNxV'></dt></q></blockquote><noframes id='X7MNxV'><i id='X7MNxV'></i>
                首 页 下载中心 网站地图 English
                 
                  您现在的位╱置: 北京英格海德分析技术有限公司 > 产品展示 > 等离子体-材料表面 > EQP等离子体质量和能量分析质谱仪
                 
                 
                EQP等离子体质量和能量分析质谱仪
                The EQP system directly measures mass and energy of both positive and negative process ions, measuring masses up to 2500 amu and ion energies up to 1000 eV.


                Hiden EQP是一〓台结合质量和能量分析的仪器(Mass and Energy Analyser for Plasma Diagnostics),用于分析等□ 离子过程中阴、阳离子、中◣性粒子以及自由基。

                  

                · 通过视口、接地电极和驱动电极▲进行分析

                       · 软件控制的离子汲↑取系统,以使等离子体扰动最小
                       · 
                所有能量范围這仙帝一走内,离子行程的最∞小扰动,及恒定离子传输
                       · 
                可调谐卐的离子源,用于电子附着选件的▓表观电势质谱分析
                       · Penning
                规和互锁装置可提供过压保护


                 

                ·  高灵敏度 / 稳定的脉冲离子计数检测器,有7个数量级的动态范围
                ·  
                带差式∮泵的三级过滤四极杆,质量数范√围至2500amu

                ·  45°静电扇区分析器,扫描能量增量 0.05 eV / 0.25eV FWHM

                ·  1000eV 选配,,漂浮电压可选至10keVFaraday 检测器∞用于高密度等离子体
                ·  Mu-Metal
                Radio-metal 屏蔽可选,高压操作可选 這一刀
                · 
                信号选通分辨率0.1μs,用于研究脉冲等离子体或☉能量、质量分布随时间的变化
                · 
                通过RS232RS485Ethernet LAN,控制软件MASsoft

                EQP Mass and Energy Plasma Analyser (3.3 MB)

                EQP Poster A3 size (254 KB)

                EQP Poster A1 size (2.53 MB)

                Mass Spectrometers for Thin Films, Plasma and Surface Engineering (1.1 MB)

                AP0280 Advantages of HIPIMS of Silver for Improved E. coli Inactivation (248 KB)

                AP0319 High power impulse magnetron sputtering (HIPIMS) and traditional pulsed sputtering (DCMSP) Ag-surfaces leading to E. coli inactivation (233KB)

                AP0322 Composition and Species Evolution in a Laser-induced LuMnO3 Plasma (381 KB)

                AP0371 In-situ Monitoring of the Growth of Silver Thin Film – the Influence of Sputtering Gas (283 KB)

                AP-EQP-0001 - Negative-ion Surface Production in Hydrogen Plasmas (286 KB)

                AP-EQP-0002 - Highly selective etching of SiO2 over Si3N4 and Si in capacitively coupled plasma employing C5HF7 gas (658 KB)

                Mass and Energy Spectra of Plasmas 50 ns Time Resolved Measurements

                Atmospheric Plasma Analysis by Molecular Beam MS (1.38 MB)

                Atmospheric Pressure Plasma Analysis ICPIG (256 KB)

                Effects of Pulsing on the P-CFUBMS of CrAIN Coatings (3.6 MB)

                Ion Energy Distributions for a DC Plasma (144 KB)

                Mass Spectroscopy of Metastable Atomic Species in Gas Analysis and Processing Plasmas at High Spectrometer Source Pressures - AVS 2011 (1.6 MB)

                Surface Analysis by Plasma Assisted Desorption Ionisation Mass Spectrometry (PADI-MS) (195 KB)

                Energy/Mass Spectrometer Analyser and Langmuir Probe Diagnostics for HIPIMS (1.88 MB)

                Plasma Diagnostics in High Power Impulse Magnetron Sputtering Discharges - TIRI JSFS 2012 Tokyo YAG (3.52 MB)

                AmesTechnology Capabilities and Facilities | Plasma Diagnostics

                Research featuring data from the Hiden Analytical EQP Mass and Energy Analyser for Plasma Diagnostics

                PSI – Paul Scherrer Institut | Plasma & Thin Film Analysis

                Plasma and Thin Film Analysis


                 
                  应用介绍
                  相关产品

                ? Copyright 2014. www.hiden.com.cn. All Rights Reserved 京ICP备05008133号  京公网安备11010802009820

                ???????